“Antimatter optics’ could make objects invisible
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This is not the scenario of a
Optics for EUV Lithography
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Higher packing density for microchips According to the roadmap for optical lithography – also known as Moore’s Law – will be from 2010 structures below 45 nm is required. One of the most promising approaches to the production of these structures is the EUV lithography (Extreme Ultra Violet). Technology Extreme radiation in the UV range [...]
